Two-Dimensional Nanograting Fabrication by Multistep Nanoimprint Lithography and Ion Beam Etching

The application of nanopatterned electrode materials is a promising method to improve the performance thin-film optoelectronic devices such as organic light-emitting diodes (OLEDs) and photovoltaics. Light coupling active layers enhanced by employing nanopatterns specifically tailored device structure. A range different typically evaluated during development process. Fabrication each these using electron-beam lithography time- cost-intensive, particularly for larger-scale devices, due serial nature electron beam writing. Here, we present generate varying depth with nanostructure designs from single one-dimensional grating template structure fixed depth. We employ multiple subsequent steps UV nanoimprint lithography, curing, ion etching fabricate greyscale two-dimensional nanopatterns. In this work, variable nanopatterning widely used material indium tin oxide. demonstrate fabrication periodic pillar-like nanostructures period lengths heights in two directions. patterned films can be either immediate or pattern reproduction conventional lithography. Pattern interesting large-scale, cost-efficient flexible devices.